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Dynamic hysteresis of an oscillatory contact line
University of Tokyo, Japan.ORCID iD: 0000-0002-3831-1758
University of Tokyo, Japan.ORCID iD: 0000-0001-6640-1921
University of Tokyo, Japan.ORCID iD: 0000-0002-3449-8682
Sorbonne Université and CNRS, France; Institut Universitaire de France, France.ORCID iD: 0000-0003-2004-9090
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2024 (English)In: Journal of Fluid Mechanics, ISSN 0022-1120, E-ISSN 1469-7645, Vol. 1000, article id A34Article in journal (Refereed) Published
Abstract [en]

During oscillatory wetting, a phase retardation emerges between contact angle variation and contact line velocity, presenting as a hysteresis loop in their correlation – an effect we term dynamic hysteresis. This phenomenon is found to be tunable by modifying the surface with different molecular layers. A comparative analysis of dynamic hysteresis, static hysteresis and contact line friction coefficients across diverse substrates reveals that dynamic hysteresis is not a result of dissipative effects but is instead proportionally linked to the static hysteresis of the surface. In the quest for appropriate conditions to model oscillatory contact line motion, we identify the generalized Hocking's linear law and modified generalized Navier boundary condition as alternative options for predicting realistic dynamic hysteresis.

Place, publisher, year, edition, pages
Cambridge University Press, 2024. Vol. 1000, article id A34
National Category
Condensed Matter Physics
Identifiers
URN: urn:nbn:se:sh:diva-55733DOI: 10.1017/jfm.2024.1040ISI: 001363135300001Scopus ID: 2-s2.0-85210981029OAI: oai:DiVA.org:sh-55733DiVA, id: diva2:1916267
Available from: 2024-11-27 Created: 2024-11-27 Last updated: 2025-10-07Bibliographically approved

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Amberg, Gustav

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Shen, JiaxingLee, YaerimLi, YuanzheZaleski, StéphaneAmberg, GustavShiomi, Junichiro
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